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Characterization of titanium thin films prepared by bias assisted magnetron sputtering

Vijaya, HS and Muralidhar, GK and Subbanna, GN and Rao, Mohan G and Mohan, S (1996) Characterization of titanium thin films prepared by bias assisted magnetron sputtering. In: Metallurgical and Materials Transactions B, 27B (6). pp. 1057-1060.

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Abstract

The deposition of metallic films such as aluminum, titanium, gold, and platinum was studied, especially for the metallization of surfaces, electrical contacts, and in the preparation of conducting coatings. The formation of the bcc titanium phase was observed when using direct current (DC) magnetron sputtering (without substrate bias) compared to the evaporated films. Using bias sputtering, the variation of stresses with operating pressure within the range of 1 to 8 mtorr and bias voltage up to -300 V were studied. Due to the importance of titanium coatings, the effect of bias voltage on the film properties such as sheet resistance, grain size, microstructure and stresses were studied.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to The Minerals, Metals & Materials Society.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Division of Chemical Sciences > Materials Research Centre
Date Deposited: 14 Sep 2007
Last Modified: 10 Jan 2012 09:03
URI: http://eprints.iisc.ernet.in/id/eprint/10876

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