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Stresses in ion assisted deposited oxide thin films

Krishna, Ghanashyam M and Al Robaee, M and Kanakaraju, S and Rao, Narasimha K and Mohan, S (1994) Stresses in ion assisted deposited oxide thin films. In: Materials Synthesis and Processing Using Ion Beams Symposium, 29 Nov.-3 Dec. 1993, Boston, MA, USA, pp. 929-934.

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Abstract

Thin films of ceria, titania and zirconia have been prepared using ion assisted deposition (IAD). The energy of ions was varied between 0 and 1 keV and current densities up to 220 μA/cm2 were used. It was found that the stress behaviour is dependent on ion species, i.e. argon or oxygen, ion energy and current density and substrate temperature apart from the material. While ceria films showed tensile stresses under the influence of argon ion bombardment at ambient temperature, they showed a sharp transition from tensile to compressive stress with increase in substrate temperature. When bombarded with oxygen ions they showed a transition from tensile to compressive stress with increase in energy. The titania films deposited with oxygen ions, on the other hand showed purely tensile stresses. Zirconia films deposited with oxygen ions, however, showed a transition from tensile to compressive stress

Item Type: Conference Paper
Additional Information: Copyright of this article belongs to Materials Research Society.
Keywords: ceramics;cerium compounds;current density;insulating thin films;internal stresses;ion beam applications;ion beam effects;titanium compounds;vacuum deposited coatings;vacuum deposition;X-ray diffraction;zirconium compounds
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 27 Sep 2007
Last Modified: 11 Jan 2012 09:10
URI: http://eprints.iisc.ernet.in/id/eprint/11003

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