ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Influence of oxygen partial pressure on the glow discharge characteristics during DC reactive magnetron sputtering

Rao, Mohan G and Mohan, S (1991) Influence of oxygen partial pressure on the glow discharge characteristics during DC reactive magnetron sputtering. In: Vacuum, 42 (9). pp. 515-517.

[img] PDF
151.pdf
Restricted to Registered users only

Download (204Kb) | Request a copy

Abstract

Reactive sputtering is a complex process involving different parameters for control The reactive gas content in the system plays a dominant role in controlling other deposition parameters. The influence of oxygen partial pressure on the cathode potentials during reactive magnetron sputtering of copper has been investigated. Based on the results obtained, a new model of reactive magnetron sputtering has been suggested.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science Ltd.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 23 Jun 2007
Last Modified: 19 Sep 2010 04:38
URI: http://eprints.iisc.ernet.in/id/eprint/11165

Actions (login required)

View Item View Item