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Precision electronic gas flow controller for thin film deposition

Shivalingappa, L and Srinivasan, MP and Mohan, S (1990) Precision electronic gas flow controller for thin film deposition. In: Measurement Science and Technology, 1 (6). pp. 512-516.

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Abstract

The fabrication details of a precision electronic gas flow controller designed to suit the requirements of available vacuum coating systems are presented. Its performance is compared with that of a commercially available gas flow controller. The incorporation of a precision reference source with coarse and fine controls in the present controller has not only improved its resolution and stability compared with the commercial controller, but also enabled exact setting of flow rates even for the minimum flow rates. The coarse and fine controls have another major advantage in transferring the flow control system from one vacuum system to the other as it could be set with respect to any chamber volume to pump speed ratio. The performance of the controller has been studied with a reactive evaporation system in the range $7^*10^{-2} to 1^*10^{-3}$ Pa and with a reactive sputtering system in the range 13 to $10^{-1}$ Pa and the results are presented.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Institute of Physics Publishing Ltd.
Keywords: electronic gas flow;thin film deposition;fabrication
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 02 Jan 2008
Last Modified: 19 Sep 2010 04:41
URI: http://eprints.iisc.ernet.in/id/eprint/12613

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