Krishna, Ghanashyam M and Rao, Narasimha K and Mohan, S (1990) Optical and structural characterization of evaporated zirconia films. In: Applied Physics Letters, 57 (6). pp. 557-559.
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Thin films of zirconia have been deposited using a reactive electron beam evaporation technique onto unheated alumina and fused silica substrates. The films were post annealed in the range $300-850^0C$. The influence of post-deposition conditions on the optical properties like refractive index and absorption and nonoptical properties like structure have been studied. The structural transitions were determined using infrared (IR) absorption and x-ray diffraction. Preliminary results of studies on the correlation between x-ray diffraction and IR absorption data for structural characterization are reported. It has been shown that the refractive index values change considerably with each structural transition, although the optical absorption does not seem to be very adversely affected by post-deposition annealing. Post-deposition annealing resulted in the formation of the cubic phase at $500^0C$ which transformed to the tetragonal phase at $700^0C$ and finally monoclinic phase at $800^0C$. The above-mentioned phases were only the major phases and post-deposition annealing did not result in single-phase material.
|Item Type:||Journal Article|
|Additional Information:||Copyright of this article belongs to American Institute of Physics|
|Keywords:||zirconia films;x-ray;electron beam evaporation technique|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||03 Dec 2007|
|Last Modified:||19 Sep 2010 04:41|
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