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A novel method of RF powder sputtering

Harshavardhanan, Solomon K and Krishna, KN (1984) A novel method of RF powder sputtering. In: Bulletin of Materials Science, 6 (6). pp. 971-977.

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Abstract

A new method of RF sputtering by which thin films of metals, semiconductors and insulators can be sputtered from their respective powders, has been successfully demonstrated. The films have been characterized for their surface and crystal structure using conventional methods of SEM and TEM. All the films are amorphous with a relatively smooth surface topography. The relative merits and demerits of the technique have been briefly discussed.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Indian Academy of Sciences.
Keywords: RF sputtering; target; shield; Crookes dark space; amorphous films; scanning electron microscopy; transmission electron microscopy
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 31 Mar 2008
Last Modified: 19 Sep 2010 04:44
URI: http://eprints.iisc.ernet.in/id/eprint/13554

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