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AFM and photoluminescence studies of swift heavy ion induced nanostructured aluminum oxide thin films

Nagabhushana, KR and Lakshminarasappa, BN and Rao, Narasimha K and Singh, Fouran and Sulania, Indra (2008) AFM and photoluminescence studies of swift heavy ion induced nanostructured aluminum oxide thin films. In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 266 (7). pp. 1049-1054.

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Abstract

E-beam evaporated aluminum oxide films were irradiated with 120 MeV swift {Au^{9+}} ions in order to induced nanostructure formation. Atomic force microscope (AFM)results showed the formation of nanostructures for films irradiated with a fluence of $1 \times 10^{13}$ ions $cm^{-2}$. The particle size estimated by section analysis of the irradiated film was in the range 25–30 nm. Glancing angle X-ray diffraction (GAXRD) revealed the amorphous nature of the films. Two strong Photoluminescence (PL) emission bands with peaks at \sim 430 nm and \sim 645 nm besides a shoulder at \sim 540 nm were observed in all irradiated samples. The PL intensity is found to increase with increase of ion fluence.

Item Type: Journal Article
Additional Information: Copyright for this article belongs to the Elsevier.
Keywords: Thin films;Swift heavy ions;Nanostructures;Atomic force microscope;Photoluminescence
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 20 Jun 2008
Last Modified: 19 Sep 2010 04:46
URI: http://eprints.iisc.ernet.in/id/eprint/14357

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