ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Reactivities of Tetrahalosilanes and Silane with Sulphur Trioxide

Suresh, BS and Padma, DK (1986) Reactivities of Tetrahalosilanes and Silane with Sulphur Trioxide. In: Polyhedron, 5 (10). pp. 1579-1580.

[img] PDF
cc.pdf
Restricted to Registered users only

Download (268Kb) | Request a copy

Abstract

Reactions of tetrahalosilanes $[SiX_4$ (X = F, Cl or Br)] and silane $(SiH_4)$ with sulphur trioxide $(SO_3)$ have been studied under different experimental conditions. Each of the silanes behaves differently in accordance with bond energy of the Si-X bond. While $SiF_4$ remains unreactive even at 600°C, $SiCl_4$ reacts with $SO_3$ at 500°C, giving rise to hexachlorodisiloxane $[(SiCl_3)_2O]$ as the major product. In contrast $SiBr_4$ and $SiH_4$ react with $SO_3$ at room temperature and below room temperature, respectively, yielding silica as one of the products of reaction. In all cases the $SO_3$ is reduced to Sulphur dioxide.

Item Type: Journal Article
Additional Information: Copyright for this article beongs to Elsevier.
Keywords: Reactivities;tetrahalosilanes;silane;sulphur trioxide.
Department/Centre: Division of Chemical Sciences > Inorganic & Physical Chemistry
Date Deposited: 29 Jul 2008
Last Modified: 19 Sep 2010 04:48
URI: http://eprints.iisc.ernet.in/id/eprint/15330

Actions (login required)

View Item View Item