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Energy deposition studies in a copper vapour laser under different pulse excitation schemes

Nakhe, SV and Rajanikanth, BS and Bhatnagar, R (2003) Energy deposition studies in a copper vapour laser under different pulse excitation schemes. In: Measuerment Science and Technology, 14 (5). pp. 607-613.

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Official URL: http://www.iop.org/EJ/abstract/0957-0233/14/5/310

Abstract

copper vapour laser is a gas discharge laser that requires fast, high-voltage, high-repetition-rate excitation pulses. In this paper, energy deposition studies in a typical copper vapour laser are reported under various pulse excitation schemes and under different operating conditions of the laser. The energy deposited in the laser tube is calculated by processing the measured voltage and current waveforms on the laser tube. This method has advantages over the calorimetric measurement method because it gives time-resolved energy deposition in the laser tube during the excitation pulse. Three different charge transfer circuits are used for pulse excitation: one is based on a thyratron switch, the second one on a magnetic pulse compressor switch and the third one on an insulated-gate bipolar transistor assisted by a magnetic pulse compressor. From studies of these circuits, it is found that the conventional thyratron-based capacitor-to-capacitor charge transfer circuit has the highest overall efficiency of energy deposition but it has the lowest energy deposition efficiency in the initial 100 ns of the pulse.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Institute of Physics.
Keywords: energy deposition, copper vapour laser, pulsed gas discharge
Department/Centre: Division of Electrical Sciences > High Voltage Engineering (merged with EE)
Date Deposited: 15 Jul 2009 09:29
Last Modified: 19 Sep 2010 04:54
URI: http://eprints.iisc.ernet.in/id/eprint/16869

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