Panwar, NS and Vargheese, K Deenamma and Rao, G Mohan (1997) Design and performance study of a scanning magnetron sputtering target. In: Review of Scientific Instruments, 68 (4). pp. 1858-1859.
Design_and_performance_study.pdf - Published Version
Restricted to Registered users only
Download (98Kb) | Request a copy
A scanning magnetron sputtering system has been developed and its performance studies are carried out in terms of target utilization, substrate temperature, and film uniformity. The magnetic field on the target surface is scanned by electromechanical movement of magnet array along the length using a step motor. The target utilization efficiency is almost 100%, The substrate temperature rise was minimum (around 50 degrees C) even when the deposition rate is about 6500 Angstrom/min. It was found that al a target-substrate distance of 6.5 cm, and a sputtering pressure of 0.025 mbar, thickness uniformity of +3% has been achieved over an area of 120 mm X80 mm.
|Item Type:||Journal Article|
|Additional Information:||Copyright of this article belongs to American Institute of Physics.|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||17 Mar 2009 10:06|
|Last Modified:||19 Sep 2010 05:25|
Actions (login required)