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Studies on the target conditioning for deposition of $LiCoO_{2}$ films

Nimisha, CS and Ganapathi, M and Munichandraiah, N and Rao, G Mohan (2009) Studies on the target conditioning for deposition of $LiCoO_{2}$ films. In: Vacuum, 83 (6). pp. 1001-1006.

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Abstract

Deposition of good quality thin films of Lithium Cobalt Oxide (LiCoO2), by sputtering is preceded by target conditioning, which dictates the surface composition, morphology and electrochemical performance of the deposited film. Sputtering from a Virgin target surface, results in films with excess of the more reactive elements. The concentration of these reactive elements in the films decreases until the system reaches a steady state after sufficient sputtering from the target. This paper discusses the deposition kinetics in terms of target conditioning of LiCoO2. The composition, morphology and texturing of deposited film during various hours of sputtering were analyzed using X-ray photoelectron Spectroscopy (XPS) and Field Emission Scanning electron microscopy (FESEM). The compositional stability is not observed in the films formed during the initial hours or Sputtering from the fresh target, which becomes stable after several hours of sputtering. The Li and Co concentration in the Films deposited subsequently is found to be varying and possible causes are discussed. After the compositional stability is reached, electrochemical analysis of LiCoO2 thin films was performed, which shows a discharge capacity of 129 mu Ah/cm(2).

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: Target conditioning;X-ray photoelectron spectroscopy;RF-magnetron sputtering;LiCoO2 thin film
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Division of Chemical Sciences > Inorganic & Physical Chemistry
Date Deposited: 09 Nov 2009 11:25
Last Modified: 19 Sep 2010 05:29
URI: http://eprints.iisc.ernet.in/id/eprint/19555

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