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Electron attachment in binary mixtures of electronegative and buffer gases

Siddagangappa, MC and Lakshminarasimha, CS and Naidu, MS (1982) Electron attachment in binary mixtures of electronegative and buffer gases. In: Journal of Physics D: Applied Physics, 15 (8). L83-L86.

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Official URL: http://www.iop.org/EJ/abstract/0022-3727/15/8/001

Abstract

The ratio of the electron attachment coefficient eta to the gas pressure p (reduced to 0 degrees C) evaluated from the Townsend current growth curves in binary mixtures of electronegative gases (SF6, CCl2F2, CO2) and buffer gases (N2, Ar, air) clearly indicate that the eta /p ratios do not scale as the partial pressure of electronegative gas in the mixture. Extensive calculations carried out using data experimentally obtained have shown that the attachment coefficient of the mixture eta mix can be expressed as eta mix= eta (1-exp- beta F/(100-F)) where eta is the attachment coefficient of the 100% electronegative gas, F is the percentage of the electronegative gas in the mixture and beta is a constant. The results of this analysis explain to a high degree of accuracy the data obtained in various mixtures and are in very good agreement with the data deduced by Itoh and co-workers (1980) using the Boltzmann equation method.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Institute of Physics.
Department/Centre: Division of Electrical Sciences > High Voltage Engineering (merged with EE)
Date Deposited: 15 Jul 2009 08:34
Last Modified: 19 Sep 2010 05:36
URI: http://eprints.iisc.ernet.in/id/eprint/21250

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