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Optimum geometry for uniform deposits on a rotating substrate from a point source

Ramprasad, BS and Radha, TS (1974) Optimum geometry for uniform deposits on a rotating substrate from a point source. In: Vacuum, 24 (4). pp. 165-166.

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Abstract

The application of an algorithm shows that maximum uniformity of film thickness on a rotating substrate is achieved for a normalized source-to-substrate distance ratio, h/r =1.183.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 19 Dec 2009 07:34
Last Modified: 19 Sep 2010 05:45
URI: http://eprints.iisc.ernet.in/id/eprint/23317

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