Influence of rapid thermal annealing (RTA) on the structural and electrical properties of SnS films

Devika, M and Reddy, N Koteeswara and Reddy, S Venkatramana and Ramesh, K and Gunasekhar, KR (2009) Influence of rapid thermal annealing (RTA) on the structural and electrical properties of SnS films. In: Journal of Materials Science: Materials in Electronics, 20 (11). pp. 1129-1134.

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Abstract

The performance of optoelectronic devices critically depends on the quality of active layer. An effective way to obtain a high quality layers is by creating excess of metal atoms through various heat treatments. Recently, rapid thermal annealing (RTA) has proved a versatile technique for the post-treatment of semiconductor materials as compared to other techniques due to its precise control over the resources. Thus, we carried out a set of experiments on SnS films to explore the influence of RTA treatment on their properties. From these experiments we noticed that the films treated at 400 °C for 1 min in N2 atmosphere have a low electrical resistivity of ~5 Ωcm with relatively high Hall mobility and carrier density of 99 cm2/Vs and 1.3 × 1016 cm−3, respectively. The observed results, therefore, emphasise that it is possible to obtain good quality SnS films through RTA treatment without disturbing their crystal structure.

Item Type:	Journal Article
Additional Information:	Copyright of this article belongs to springer.
Department/Centre:	Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU) Division of Physical & Mathematical Sciences > Physics
Date Deposited:	16 Dec 2009 10:04
Last Modified:	19 Sep 2010 05:47
URI:	http://eprints.iisc.ernet.in/id/eprint/23823

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