Chakrabarti, Utpal K (1975) Approximate solution for the redistribution of impurities during second oxidation. In: IEEE Transactions on Electron Devices, 22 (8). pp. 566-568.
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The impurity profile for the second oxidation, used in MOST fabrication, has been obtained by Margalit et al. . The disadvantage of this technique is that the accuracy of their solution is directly dependent on the computer time. In this article, an analytical solution is presented using the approximation of linearizing the second oxidation procedure.
|Item Type:||Journal Article|
|Additional Information:||Copyright 1975 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.|
|Department/Centre:||Division of Electrical Sciences > Electrical Engineering|
|Date Deposited:||23 Oct 2009 04:32|
|Last Modified:||19 Sep 2010 05:48|
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