Ramprasad, BS and Radha, TS and Rao, Ramakrishna M (1972) An Algorithm for Optimization of Experimental Parameters for Maximum Uniformity of Film Thickness. In: Journal of Vacuum Science and Technology, 9 (3). pp. 1104-1105.
A simple method for evaluating the geometrical parameters yielding maximum uniformity of film thickness on rotating substrates is described. The algorithm is based on numerical integration of the function for relative thickness. It is shown that maximum uniformity is obtained for a normalized source-to-substrate distance ratio of h/ \delta = 1.37.
|Item Type:||Journal Article|
|Additional Information:||Copyright for this article belongs to American Vacuum Society.|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||05 Apr 2005|
|Last Modified:||19 Sep 2010 04:18|
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