Ramprasad, BS and Radha, TS and Rao, Ramakrishna M (1972) On Uniformity of Film Thickness on Rotating Substrates. In: Journal of Vacuum Science and Technology, 9 (4). pp. 1227-1228.
For most applications of thin films, uniformity of film thickness over the substrate area is a necessary requirement. An investigation is being carried out in the laboratory to obtain uniform films on optical components. During the course of investigation, it was observed that reported values of geometrical parameters assumed for minimum variation in film thickness, based on the equation derived by Holland and Steckelmacher,' differ widely. Film thickness distribution curves presented by R4acleod2 are found to be in error. The corrected distribution curves are presented. Also the thickness distribution curves are presented in a form in which suitable geometrical parameters can be chosen readily to yield the desired uniformity in thickness over the area of the substrate.
|Item Type:||Journal Article|
|Additional Information:||Copyright for this article belongs to American Vacuum Society.|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||05 Apr 2005|
|Last Modified:||19 Sep 2010 04:18|
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