Gunasekhar, KR and Krishna, Ghanashyam M and Raju, AR and Krishna, KN and Mohan, S (1996) Effects of oblique energetic bombardment on the morphology and microstructure of triode ion plated titanium films. In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 14 (2). pp. 352-358.
The effect of angle of incidence of ions, varied between 45° and 90°, generated in a triode ion plating system on the morphology and microstructure of titanium films, has been investigated. It has been found that intensity of reflections, lattice parameters, stress, and grain size are strong functions of the angle of incidence of the ions. The same properties were studied for their variation with bias voltage between 0 and 2 kV at a constant substrate bias current of 10 mA. It was found that the intensity of the (002) reflection increases with an increase in angle of ion incidence up to 60°. The lattice parameter and stress reach a minimum while the grain size goes through a maximum at this value. All the films show a tensile stress independent of deposition parameters. To isolate the effects due to ion bombardment the films have been coated in high vacuum, in a diode mode, and finally the triode configuration. It has been conclusively found that the angle of incidence of ions is very important in controlling properties and growth of the films.
|Item Type:||Journal Article|
|Additional Information:||Copyright for this article belongs to American Vacuum Society.|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Division of Chemical Sciences > Materials Research Centre
|Date Deposited:||05 Apr 2005|
|Last Modified:||19 Sep 2010 04:18|
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