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Optimization studies on magnetic field geometry for planar magnetron sputtering targets

Rao, Mohan G and Mohan, S (1991) Optimization studies on magnetic field geometry for planar magnetron sputtering targets. In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 9 (6). 3100 -3104.

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Abstract

The present study deals with the design aspects of planar magnetron sputtering targets. A permanent ring magnet with modified pole piece geometry has been used for maximum ionization efficiency. The efficiency of electron containment on the target surface has been evaluated in terms of current at the electrically isolated substrates. The details of the relation between the magnetic field strength and field geometry on the ionization currents and operating pressure have been discussed. The best among the designs studied, when operated at a pressure of $8×10^-^3$ Torr resulted in a deposition rate of about 2000 A/min at a current density of 4 mA/cm2. The substrate temperature rise was about 20°C under these conditions. The design details of the magnetrons, experimentation for evaluating the electron containment have been discussed in this article.

Item Type: Journal Article
Additional Information: Copyright for this article belongs to American Vacuum Society.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 05 Apr 2005
Last Modified: 19 Sep 2010 04:18
URI: http://eprints.iisc.ernet.in/id/eprint/2747

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