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Studies on the properties of zirconia films prepared by direct current reactive magnetron sputtering

Suhail, MH and Rao, Mohan G and Mohan, S (1991) Studies on the properties of zirconia films prepared by direct current reactive magnetron sputtering. In: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 9 (5). 2675 -2677.

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Abstract

This paper deals with the preparation of zirconia films by direct current reactive magnetron sputtering. The films were annealed in ambient atmosphere at temperatures ranging from 300 to $850^oC$. The as deposited films were found to be amorphous and a crystalline structure developed at 400^0C. The refractive index and extinction coefficient were found to be 1.93 and $0.5X10(^-^3)$ at 600nm for the as deposited films and they changed to 1.71 and $2.5X10(^-^3)$ on annealing at $850^oC$. The optical constants were found to be constant in the wavelength region beyond 400nm, below which dispersion was observed.

Item Type: Journal Article
Additional Information: Copyright for this article belongs to American Vacuum Society.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 14 Sep 2006
Last Modified: 19 Sep 2010 04:18
URI: http://eprints.iisc.ernet.in/id/eprint/2749

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