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Influence of substrate temperature and post-deposition heat treatment on the optical properties of SiO2 films

Rao, Narasimha K and Mohan, S (1989) Influence of substrate temperature and post-deposition heat treatment on the optical properties of SiO2 films. In: Thin Solid Films, 170 (2). pp. 179-184.

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Official URL: http://dx.doi.org/10.1016/0040-6090(89)90722-0

Abstract

Silicon dioxide films are extensively used as protective, barrier and also low index films in multilayer optical devices. In this paper, the optical properties of electron beam evaporated SiO2 films, including absorption in the UV, visible and IR regions, are reported as a function of substrate temperature and post-deposition heat treatment. A comparative study of the optical properties of SiO2 films deposited in neutral and ionized oxygen is also made.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 25 Aug 2010 07:14
Last Modified: 19 Sep 2010 06:14
URI: http://eprints.iisc.ernet.in/id/eprint/31518

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