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Microwave irradiation-assisted method for the deposition of adherent oxide films on semiconducting and dielectric substrates

Brahma, Sanjaya and Shivashankar, SA (2010) Microwave irradiation-assisted method for the deposition of adherent oxide films on semiconducting and dielectric substrates. In: Thin Solid Films, 518 (21). pp. 5905-5911.

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Official URL: http://dx.doi.org/10.1016/j.tsf.2010.05.078

Abstract

We report a method for the deposition of thin films and thick coatings of metal oxides through the liquid medium, involving the micro waveirradiation of a solution of a metal-organic complex in a suitable dielectric solvent. The process is a combination of sol-gel and dip-coating methods, wherein coatings can be obtained on nonconducting and semiconducting substrates, within a few minutes. Thin films of nanostructured ZnO (wurtzite) have been obtained on Si(100), glass and polymer substrates, the nanostructure determined by process parameters The coatings are strongly adherent and uniform over 15 mm x 15 mm, the growth rate similar to 0.25 mu m/min Coatings of nanocrystalline Fe2O3 and Ga2O3 have also been obtained The method is scalable to larger substrates, and is promising as a low temperature technique for coating dielectric substrates, including flexible polymers. (C) 2010 Elsevier B.V. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: Nanostructures; Thin films; Coatings; Oxides; X-ray diffraction; Electron microscopy; Microwave irradiation; Deposition from solutions.
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Other Centres/Units > Centre for Nano Science and Engineering
Date Deposited: 08 Sep 2010 06:38
Last Modified: 13 Oct 2011 07:25
URI: http://eprints.iisc.ernet.in/id/eprint/32012

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