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Characterization of compact ICP ion source for focused ion beam applications

Nabhiraj, PY and Menon, Ranjini and Rao, Mohan G and Mohan, S and Bhandari, RK (2010) Characterization of compact ICP ion source for focused ion beam applications. In: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 621 (1-3). pp. 57-61.

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Official URL: http://dx.doi.org/10.1016/j.nima.2010.04.069

Abstract

A compact, high brightness 13.56 MHz inductively coupled plasma ion source without any axial or radial multicusp magnetic fields is designed for the production of a focused ion beam. Argon ion current of density more than 30 mA/cm(2) at 4 kV potential is extracted from this ion source and is characterized by measuring the ion energy spread and brightness. Ion energy spread is measured by a variable-focusing retarding field energy analyzer that minimizes the errors due t divergence of ion beam inside the analyzer. Brightness of the ion beam is determined from the emittance measured by a fully automated and locally developed electrostatic sweep scanner. By optimizing various ion source parameters such as RF power, gas pressure and Faraday shield, ion beams with energy spread of less than 5 eV and brightness of 7100 Am(-2)sr(-1)eV(-1) have been produced. Here, we briefly report the details of the ion source, measurement and optimization of energy spread and brightness of the ion beam. (C) 2010 Elsevier B.V. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: Inductively coupled plasma ion source; Ion energy spread; Brightness.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 16 Sep 2010 06:07
Last Modified: 19 Sep 2010 06:16
URI: http://eprints.iisc.ernet.in/id/eprint/32121

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