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Mass analyser optics for wide-beam ion sources in ion implantation systems

Krishnarajulu, B and Muralidhar, GK and Mohan, S and Menon, AG (1989) Mass analyser optics for wide-beam ion sources in ion implantation systems. In: Journal of Physics E - Scientific Instruments, 22 (8). pp. 666-668.

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Official URL: http://iopscience.iop.org/0022-3735/22/8/027

Abstract

Ion implantation systems, used for producing high-current ion beams, employ wide-beam ion sources which are rotated through 90 degrees . These sources need mass analyser optics which are different from the conventional design. The authors present results of calculation of the image distance as a function of entrance and exit angles of a sector magnet mass analyser having such a source. These computations have been performed for the magnetic deflection angles 45 degrees , 60 degrees and 90 degrees . The details of the computations carried out using the computer program MODBEAM, developed for this purpose, are also discussed.

Item Type: Editorials/Short Communications
Additional Information: Copyright of this article belongs to Institute of Physics.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 14 Oct 2010 07:51
Last Modified: 14 Oct 2010 07:51
URI: http://eprints.iisc.ernet.in/id/eprint/33192

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