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Optimization of ion energy spread in inductively coupled plasma source designed for focused ion beam applications

Nabhiraj, PY and Menon, Ranjini and Rao, Mohan G and Mohan, S and Bhandari, RK (2010) Optimization of ion energy spread in inductively coupled plasma source designed for focused ion beam applications. In: Vacuum, 85 (2). pp. 344-348.

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Official URL: http://dx.doi.org/10.1016/j.vacuum.2010.07.008

Abstract

The ion energy distribution of inductively coupled plasma ion source for focused ion beam application is measured using a four grid retarding field energy analyzer. Without using any Faraday shield, ion energy spread is found to be 50 eV or more. Moreover, the ion energy distribution is found to have double peaks showing that the power coupling to the plasma is not purely inductive, but a strong parasitic capacitive coupling is also present. By optimizing the various source parameters and Faraday shield, ion energy distribution having a single peak, well separated from zero energy and with ion energy spread of 4 eV is achieved. A novel plasma chamber, with proper Faraday shield is designed to ignite the plasma at low RF powers which otherwise would require 300-400 W of RF power. Optimization of various parameters of the ion source to achieve ions with very low energy spread and the experimental results are presented in this article. (C) 2010 Elsevier Ltd. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: Inductively coupled plasma; Ion energy spread; Retarding field energy analyzer; Faraday shield.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 26 Oct 2010 07:18
Last Modified: 26 Oct 2010 07:18
URI: http://eprints.iisc.ernet.in/id/eprint/33395

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