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Effect of substrate temperature on the properties of ZrO2 films prepared by d.c. reactive magnetron sputtering

Suhail, MH and Rao, Mohan G and Mohan, S (1992) Effect of substrate temperature on the properties of ZrO2 films prepared by d.c. reactive magnetron sputtering. In: Materials Science and Engineering: B, 12 (3). pp. 247-251.

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Official URL: http://dx.doi.org/10.1016/0921-5107(92)90295-K

Abstract

Studies of ZrO2 films prepared by d.c. reactive magnetron sputtering are described. The effects of substrate temperature on the packing density, refractive index, extinction coefficient and crystallinity phase have been investigated in the temperature range 25–450 °C. The refractive index varied from 1.84 to 1.95 and extinction coefficient from 2 × 10−3 to 9.6 × 10−3. This was explained on the basis of an increase in packing density from 0.686 to 0.813. The change in packing density has been attributed to a decrease in the oxygen condensation at higher temperatures. Annealing results in a decrease in refractive index and increase in extinction coefficient. The films deposited at 150 °C showed a monoclinic phase which transforms to a tetragonal phase at higher substrate temperatures.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier science.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 24 Jan 2011 10:49
Last Modified: 24 Jan 2011 10:49
URI: http://eprints.iisc.ernet.in/id/eprint/35203

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