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A novel laser direct write technique for fabrication of thin film MICs

Harish, CM and Kumar, V and Prabhakar, A (1993) A novel laser direct write technique for fabrication of thin film MICs. In: IEEE Transactions on Semiconductor Manufacturing, 6 (3). pp. 279-282.

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Abstract

A technique for fabrication of thin-film circuits for microwave integrated circuit (MIC) application is presented. This low-cost fabrication technique utilizes laser direct write of copper patterns on alumina substrates. The method obviates the need for photomasks and photolithography. The film deposition mechanism, deposit film analysis, and MIC fabrication sequence are presented. Performance evaluation of MICs fabricated using this technique is also included

Item Type: Editorials/Short Communications
Additional Information: Copyright 1993 IEEE. Personal use of this material is permitted.However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Date Deposited: 31 Jan 2011 05:14
Last Modified: 31 Jan 2011 05:14
URI: http://eprints.iisc.ernet.in/id/eprint/35298

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