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X-ray-reflectivity study of Ge-Si-Ge films

Banerjee, S and Sanyal, MK and Datta, A and Kanakaraju, S and Mohan, S (1996) X-ray-reflectivity study of Ge-Si-Ge films. In: Physical Review B: Condensed Matter, 54 (23). pp. 16377-16380.

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Official URL: http://prb.aps.org/abstract/PRB/v54/i23/p16377_1

Abstract

Here we report on an x-ray specular reflectivity study of Ce-Si-Ge trilayers grown on Si(001) single-crystal substrate by ion beam sputtering deposition at various substrate temperatures. The electron-density profile of the trilayer as a function of depth, obtained from x-ray-reflectivity data, reveals an intermixing of Si and Ge. The x-ray-reflectivity data have been analyzed using a scheme based on the distorted-wave Born approximation, and the validity of the analysis scheme was checked using simulated data. Analyzed results provided information regarding interdiffusion in this system. We notice that although the Si-on-Ge interface is sharp, a Si0.4Ge0.6 alloy is formed at the Ge-on-Si interface.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to The American Physical Society.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 19 May 2011 05:32
Last Modified: 19 May 2011 05:32
URI: http://eprints.iisc.ernet.in/id/eprint/37698

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