ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Fatigue crack growth under an eqivalent falstaff spectrum

Mitchenko, EI and Prakash, Raghu V and Sunder, R (1995) Fatigue crack growth under an eqivalent falstaff spectrum. In: Fatigue and Fracture of Engineering Materials and Structures, 18 (5). pp. 583-595.

Full text not available from this repository.
Official URL: http://onlinelibrary.wiley.com/doi/10.1111/j.1460-...

Abstract

Optical fractography was used to estimate growth of small cracks at notches under programmed FALSTAFF loading in an Al-Cu alloy. Crack sizes as low as 25 microns and growth rates over two orders of magnitude could be resolved using this technique. Randomized MiniFALSTAFF load sequence was modified into a programmed load equivalent with major loads either preceding or following marker loads. Crack growth rate under programmed FALSTAFF spectrum as estimated by optical fractography conformed to compliance based estimates on a SE(T) specimen. Long crack growth rates under programmed and randomized MiniFALSTAFF spectrum were essentially similar. Spectrum load fatigue crack growth was studied in central hole coupons under notch inelastic conditions. Scatter in growth rates for small notch cracks was found to be of the same magnitude as that of long cracks. Multiple fatigue cracks are observed at the notch root, and they appear to influence each other.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to John Wiley and Sons.
Department/Centre: Others
Date Deposited: 18 May 2011 10:35
Last Modified: 18 May 2011 10:35
URI: http://eprints.iisc.ernet.in/id/eprint/37735

Actions (login required)

View Item View Item