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Structure and composition related properties of titania thin films

Krishna, Ghanashyam M and Kanakaraju, S and Mohan, S (1995) Structure and composition related properties of titania thin films. In: Vacuum, 46 (1). pp. 33-36.

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Official URL: http://dx.doi.org/10.1016/0042-207X(93)E0004-5

Abstract

The dependence of optical constants, structure and composition of titania thin films on the process parameters has been investigated. Films were deposited using both reactive electron beam evaporation and ion Assisted Deposition(IAD). If has been observed that the refractive index of IAD films is higher than that for the reactively deposited films, without much difference in the extinction coefficient. Electron paramagnetic resonance has been used to estimate qualitatively the presence of non-stoichiometry in the films. It has been found that these spectra correlate very well the optical behaviour of the films. X-ray diffraction studies revealed that the neutral oxygen deposited films were stress free, while the IAD films showed tensile stress. The lattice parameters showed anisotropic change with ion beam parameters.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 26 May 2011 04:30
Last Modified: 26 May 2011 04:30
URI: http://eprints.iisc.ernet.in/id/eprint/37926

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