Balu, R and Raju, AR and Lakshminarayanan, V and Mohan, S (2005) Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films. In: Materials Science And Engineering: B, 123 (1). pp. 7-12.
Chromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposited on them. Hence, optimization of the structure and properties of chromium under layers is essential for realizing magnetic thin films with desired properties. In this paper,we report the structural variation observed in chromium thin films deposited on silicon(1 0 0) substrates deposited using Ion Beam SputterDeposition (IBSD) technique. The influence of process parameters, such as ion beam current density, substrate temperature and the angle ofi ncidence of the condensing species, on the structural transformation from (1 1 0) orientation to (2 0 0) orientation has been presented. The structural variation and morphological variations observed have been discussed based on the growth models and the energetics involved in the process.
|Item Type:||Journal Article|
|Additional Information:||Copyright for this article belongs to Elsevier.|
|Keywords:||Chromium thin films;Ion Beam Sputter Deposition (IBSD);Oblique deposition|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||25 Oct 2005|
|Last Modified:||19 Sep 2010 04:20|
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