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Characterization of electrochemically deposited Cu-Ni black coatings

Aravinda, CL and Bera, Parthasarathi and Jayaram, V and Sharma, AK and Mayanna, SM (2002) Characterization of electrochemically deposited Cu-Ni black coatings. In: Materials Research Bulletin, 37 (3). pp. 397-405.

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Official URL: http://dx.doi.org/10.1016/S0025-5408(01)00821-2

Abstract

Electrochemically deposited Cu-Ni black coatings on molybdenum substrate from ethylenediaminetetraacetic acid (EDTA) bath solution are shown to exhibit good optical properties (alpha = 0.94, epsilon = 0.09). The deposit is characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). Cu is present in metallic and +2 oxidation states in the as-prepared Cu-Ni black coating, whereas Ni2+ as well as Ni3+ species are observed in the same coating. Cu and Ni are observed in their metallic state after 10 and 20 min sputtering. X-ray initiated Auger electron spectroscopy (XAES) of Cu and Ni also agrees well with XPS investigations. (C) 2002 Elsevier Science Ltd. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science.
Keywords: A.Alloys;A.Thin films;C.Photoelectron spectroscopy;D.Optical properties;D.Microstructure
Department/Centre: Division of Chemical Sciences > Solid State & Structural Chemistry Unit
Date Deposited: 22 Jul 2011 10:18
Last Modified: 22 Jul 2011 10:18
URI: http://eprints.iisc.ernet.in/id/eprint/39035

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