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Stresses in Ion Assisted Deposited Oxide Thih Films

Krishna, Ghanashyam M and Robaee, Mansour Al and Kanakaraju, S and Rao, Narasimha K (1993) Stresses in Ion Assisted Deposited Oxide Thih Films. In: MRS Proceedings, 316 . p. 929.

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Official URL: http://journals.cambridge.org/action/displayAbstra...

Abstract

Thin films of Ceria, Titania and Ziroonia have been prepared using Ion Assisted Deposition(IAD). The energy of ions was varied between 0 and 1 keV and current densities up to 220 μA/cm were used. It was found that the stress behaviour is dependent on ion species, i.e. Argon or Oxygen, ion energy and current density and substrate temperature apart from the material. While oeria files showed tensile stresses under the influence of argon ion bombardment at ambient temperature, they showed a sharp transition from tensile to compressive stress with increase in substrate temperature. When bombarded with oxygen ions they showed a transition from tensile to compressive stress with increase in energy. The titania films deposited with oxygen ions, on the other hand showed purely tensile stresses. Zirconia films deposited with oxygen ions, however, showed a transition from tensile to compressive stress.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Cambridge University Press.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 11 Aug 2011 13:51
Last Modified: 11 Aug 2011 13:51
URI: http://eprints.iisc.ernet.in/id/eprint/39840

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