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Thin Films of Titanium Dioxide Prepared by Chemical Routes using Novel Precursors

Shalini, K and Chandrasekaran, S and Shivashankar, SA (2002) Thin Films of Titanium Dioxide Prepared by Chemical Routes using Novel Precursors. In: MRS Proceedings, 755 . DD7.4.

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Official URL: http://journals.cambridge.org/action/displayAbstra...

Abstract

Novel, volatile, stable, oxo-β-ketoesterate complexes of titanium, whose synthesis requires only an inert atmosphere, as opposed to a glove box, have been developed. Using one of the complexes as the precursor, thin films of TiO2 have been deposited on glass substrates by metalorganic chemical vapor deposition (MOCVD) at temperatures ranging from 400°C to 525°C and characterized by scanning electron microscopy, transmission electron microscopy, and atomic force microscopy. All the films grown in this temperature range are very smooth; those grown above 480°C consist of nearly monodisperse, nanocrystals of the anatase phase. Optical studies show the bandgaps in the range 3.4–3.7 eV for films grown at different temperatures. Thin films of anatase TiO2 have also been grown by spin-coating technique using another ketoesterate complex of titanium, demonstrating that the newly developed complexes can be successfully used for thin film growth by various chemical routes.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Cambridge University Press.
Department/Centre: Division of Chemical Sciences > Organic Chemistry
Date Deposited: 11 Aug 2011 13:09
Last Modified: 11 Aug 2011 13:09
URI: http://eprints.iisc.ernet.in/id/eprint/39863

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