ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Growth and study of BaZrO3 thin films by pulsed excimer laser ablation

Rajasekarakumar, V and Victor, P and Ranjith, R and Saha, S and Rajagopalan, S and Tyagi, AK and Krupanidhi, SB (2003) Growth and study of BaZrO3 thin films by pulsed excimer laser ablation. In: MRS Proceedings, 784 .

Full text not available from this repository.
Official URL: http://journals.cambridge.org/action/displayAbstra...

Abstract

Thin films of BaZrO3 (BZ) were grown using a pulsed laser deposition technique on platinum coated silicon substrates. Films showed a polycrystalline perovskite structure upon different annealing procedures of in-situ and ex-situ crystallization. The composition analyses were done using Energy dispersive X-ray analysis (EDAX) and Secondary ion mass spectrometry (SIMS). The SIMS analysis revealed that the ZrO2 formation at the right interface of substrate and the film leads the degradation of the device on the electrical properties in the case of ex-situ crystallized films. But the in-situ films exhibited no interfacial formation. The dielectric properties have been studied for the different temperatures in the frequency regime of 40 Hz to 100kHz. The response of the film to external ac stimuli was studied at different temperatures, and it showed that ac conductivity values in the limiting case are correspond to oxygen vacancy motion. The electrical modulus is fitted to a stretched exponential function and the results clearly indicate the presence of the non-Debye type of dielectric relaxation in these materials.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Cambridge University Press.
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 18 Aug 2011 06:39
Last Modified: 18 Aug 2011 06:39
URI: http://eprints.iisc.ernet.in/id/eprint/39920

Actions (login required)

View Item View Item