Bujjamma, J and Ganapathi, KL and Mohan, S (2009) Ion Assisted Deposition of HfO2 thin films for CMOS gate dielectric applications. In: Oral presentation in ICMAT-2009.
Full text not available from this repository.| Item Type: | Conference Paper |
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| Department/Centre: | Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU) |
| Date Deposited: | 16 Dec 2011 08:33 |
| Last Modified: | 16 Dec 2011 08:33 |
| URI: | http://eprints.iisc.ernet.in/id/eprint/41228 |
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