ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Ion Assisted Deposition of HfO2 thin films for CMOS gate dielectric applications

Bujjamma, J and Ganapathi, KL and Mohan, S (2009) Ion Assisted Deposition of HfO2 thin films for CMOS gate dielectric applications. In: Oral presentation in ICMAT-2009.

Full text not available from this repository.
Item Type: Conference Paper
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 16 Dec 2011 08:33
Last Modified: 16 Dec 2011 08:33
URI: http://eprints.iisc.ernet.in/id/eprint/41228

Actions (login required)

View Item View Item