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Structural and Electrical Properties of Er 203 Thin Films Deposited by RF Sputtering for Gate Dielectric Applications

Deepak, GC and Bhat, Navakanta and Shivashankar, SA (2007) Structural and Electrical Properties of Er 203 Thin Films Deposited by RF Sputtering for Gate Dielectric Applications. In: E1-0586, 211th ECS Meeting, Chicago, USA, May 2007, USA.

Full text not available from this repository.
Item Type: Conference Paper
Department/Centre: Division of Electrical Sciences > Electrical Communication Engineering
Date Deposited: 14 Oct 2011 10:13
Last Modified: 14 Oct 2011 10:13
URI: http://eprints.iisc.ernet.in/id/eprint/41438

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