Nimisha, CS and Venkatesh, G and Munichandraiah, N and Rao, Mohan G (2011) The effect of electrochemical lithiation on physicochemical properties of RF-sputtered Sn thin films. In: Journal of Applied Electrochemistry, 41 (11). pp. 1287-1294.
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Thin films of Sn were deposited on Pt/Si substrates by sputtering technique and subjected to electrochemical lithiation studies. Electrochemical lithiation of Sn resulted in the formation of Sn-Li alloys of different compositions. Charging of Sn-coated Pt/Si electrodes was terminated at different potentials and the electrodes were examined for physicochemical properties. The scanning electron microscopy and atomic force microscopy images suggested that the Sn films expanded on lithiation. Roughness of the film increased with an increase in the quantity of Li present in Sn-Li alloy. Electrochemical impedance data suggested that the kinetics of charging became sluggish with an increase in the quantity of Li in Sn-Li alloy.
|Item Type:||Journal Article|
|Additional Information:||Copyright of this article belongs to Springer.|
|Keywords:||Tin films;RF sputtering;Electrochemical lithiation;Surface roughness|
|Department/Centre:||Division of Chemical Sciences > Inorganic & Physical Chemistry
Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
|Date Deposited:||08 Nov 2011 11:43|
|Last Modified:||08 Nov 2011 11:43|
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