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SOS films and interfaces: chemical aspects

Rao, Bhogeswara D and Jacob, KT (1982) SOS films and interfaces: chemical aspects. In: Journal of Crystal Growth, 58 (1). pp. 79-86.

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Official URL: http://dx.doi.org/10.1016/0022-0248(82)90212-3

Abstract

The possible chemical reactions that take place during the growth of single crystal films of silicon on sapphire (SOS) are analyzed thermodynamically. The temperature for the growth of good quality epitaxial films is dependent on the extent of water vapor present in the carrier gas. The higher the water vapor content the higher the temperature needed to grow SOS films. Due to the interaction of silicon with sapphire at elevated temperatures, SOS films are doped with aluminum. The extent of doping is dependent on the conditions of film growth. The doping by aluminum from the substrate increases with increasing growth temperatures and decreasing growth rates. The equilibrium concentrations of aluminum at the silicon-sapphire interface are calculated as a function of deposition temperature, assuming that SiO2 or Al6Si2O13 are the products of reaction. It is most likely that the product could be a solid solutio n of Al2O3 in SiO2. The total amount of aluminum released due to the interaction between silicon and sapphire will account only for the formation of not more than one monolayer of reaction product unless the films are annealed long enough at elevated temperatures. This value is in good agreement with the recently reported observations employing high resolution transmission electron microscopy.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science B.V.
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Date Deposited: 05 Dec 2011 07:19
Last Modified: 05 Dec 2011 07:19
URI: http://eprints.iisc.ernet.in/id/eprint/42561

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