Kumar, Prashant and Sangeeth, K (2011) Chromium Nanowires Grown Inside Lithographically Fabricated U-Trench Templates. In: Nanoscience and Nanotechnology Letters, 3 (5). pp. 643-647.
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Chromium nanowires of diameter 40-120 nm have been grown inside lithographically fabricated U-trench templates on oxidized silicon substrate by RF sputtering deposition technique. Under favourable experimental conditions, very long nanowires can be grown which depends on the trench length and surface homogeneity along the axis. Surface wettability control by the restricted supply of metal vapour is the key for the formation of nanowires. Diameter/depth ratio for the trench template is demonstrated to be crucial for the growth of nanowires.
|Item Type:||Journal Article|
|Additional Information:||Copyright of this article belongs to American Scientific Publishers.|
|Department/Centre:||Other Centres/Units/UG Programme > Centre for Nano Science and Engineering|
|Date Deposited:||09 Mar 2012 11:34|
|Last Modified:||09 Mar 2012 11:41|
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