ePrints@IIScePrints@IISc Home | About | Browse | Latest Additions | Advanced Search | Contact | Help

Non-thermal plasma applications at Very Low Temperature

Mizuno, A and Rajanikanth, BS and Shimizu, K and Kinoshita, K and Yanagihara, K and Okumoto, M and Katsura, S (1995) Non-thermal plasma applications at Very Low Temperature. In: Combustion Science and Technology , 133 (1-3). pp. 49-63.

[img] PDF
00102209808952026.pdf - Published Version
Restricted to Registered users only

Download (398Kb) | Request a copy
Official URL: http://www.tandfonline.com/doi/abs/10.1080/0010220...

Abstract

Application of non-thermal plasma for gas cleaning is gaining prominence in the recent years. Normally, the gas treatment was carried out at or above room temperature, by the dry type plasma reactor. However, this treatment is still inadequate in the removal of certain stable gases present in the flue gas mixture. We propose the non-thermal plasma process at very low temperature, and report here some interesting results of treatment of NO or N2O with pulsed plasma below — 100°C ambient temperature. Direct methanol synthesis from CH4 and CO2 at very low temperature is also reported. A comparative analysis of the various tests are presented together with a note on the energy consideration

Item Type: Journal Article
Department/Centre: Division of Electrical Sciences > Electrical Engineering
Date Deposited: 28 Mar 2012 10:06
Last Modified: 28 Mar 2012 10:17
URI: http://eprints.iisc.ernet.in/id/eprint/44136

Actions (login required)

View Item View Item