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Growth of rutile TiO2 nanorods on TiO2 seed layer deposited by electron beam evaporation

Tamilselvan, V and Yuvaraj, D and Kumar, Rakesh R and Rao, Narasimha K (2012) Growth of rutile TiO2 nanorods on TiO2 seed layer deposited by electron beam evaporation. In: Applied Surface Science, 258 (10). pp. 4283-4287.

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Official URL: http://dx.doi.org/10.1016/j.apsusc.2011.12.079

Abstract

Dense rutile TiO2 nanorods were grown on anatase TiO2 seed layer coated glass substrate by solution technique. The crystalline nature of nanorods has confirmed by transmission electron microscopy. The band gap of the TiO2 seed layer and nanorods were calculated using the UV-vis absorption spectrum and the band gap value of the anatase seed layer and rutile nanorods were 3.39 eV and 3.09 eV respectively. Water contact angle measurements were also made and showed that the contact angle of rutile nanorods was (134 degrees) larger than the seed layer contact angle (93 degrees). The RMS surface roughness of the TiO2 seed layer (0.384 nm) and nanorods film (18.5 nm) were measured by an atomic force microscope and correlated with their contact angle values. (C) 2011 Elsevier B.V. All rights reserved.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier Science B.V.
Keywords: Titanium dioxide;Hydrothermal crystal growth;UV absorption; Hydrophobic property
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 10 Apr 2012 07:31
Last Modified: 10 Apr 2012 07:31
URI: http://eprints.iisc.ernet.in/id/eprint/44162

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