Bysakh, S and Kumar, A and Kamat, SV and Sharma, SK and Mohan, S (2012) Influence of annealing on oxidation, microstructure and mechanical properties of Ni-49Ti films. In: Journal of Materials Research, 27 (7). pp. 1068-1079.
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Thin films of Ni-49 at.% Ti were deposited by DC magnetron sputtering on silicon substrates at 300 degrees C. The as-deposited amorphous films were annealed at a vacuum of 10(-6) mbar at various temperatures between 300 and 650 degrees C to study the effect of annealing on microstructure and mechanical properties. The as-deposited films showed partial crystallization on annealing at 500 degrees C. At 500 degrees C, a distinct oxidation layer, rich in titanium but depleted in Ni, was seen on the film surface. A gradual increase in thickness and number of layers of various oxide stoichiometries as well as growth of triangular shaped reaction zones were seen with increase in annealing temperature up to 650 degrees C. Nanoindentation studies showed that the film hardness values increase with increase in annealing temperature up to 600 degrees C and subsequently decrease at 650 degrees C. The results were explained on the basis of the change in microstructure as a result of oxidation on annealing.
|Item Type:||Journal Article|
|Additional Information:||Copyright for this article belongs to Materials Research Society|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||13 Jun 2012 10:16|
|Last Modified:||18 Jun 2012 10:13|
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