Nimisha, CS and Venkatesh, G and Rao, Yellareswara K and Rao, Mohan G and Munichandraiah, N (2012) Morphology dependent electrochemical performance of sputter deposited Sn thin films. In: MATERIALS RESEARCH BULLETIN, 47 (8). pp. 1950-1953.
mat_res_bul_47-8_1950-1953_2012.pdf - Published Version
Restricted to Registered users only
Download (872Kb) | Request a copy
This study deals with tailoring of the surface morphology, microstructure, and electrochemical properties of Sn thin films deposited by magnetron sputtering with different deposition rates. Scanning electron microscopy and atomic force microscopy are used to characterize the film surface morphology. Electrochemical properties of Sn thin film are measured and compared by cyclic voltammetry and charge-discharge cycle data at a constant current density. Sn thin film fabricated with a higher deposition rate exhibited an initial discharge capacity of 798 mAh g(-1) but reduced to 94 mAh g(-1) at 30th cycle. Film deposited with lower deposition rate delivered 770 mAh g(-1) during 1st cycle with improved capacity retention of 521 mAh g(-1) on 30th cycle. Comparison of electrochemical performances of these films has revealed important distinctions, which are associated with the surface morphology and hence on rate of deposition. (C) 2012 Elsevier Ltd. All rights reserved.
|Item Type:||Journal Article|
|Additional Information:||Copy right for this article belongs to Elsevier Ltd|
|Keywords:||Thin films;Sputtering;Electrochemical measurements;Electron microscopy;Atomic force microscopy|
|Department/Centre:||Division of Chemical Sciences > Inorganic & Physical Chemistry
Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
|Date Deposited:||03 Aug 2012 04:54|
|Last Modified:||03 Aug 2012 05:02|
Actions (login required)