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Impact of microstructure on the electrical properties of zirconium titanate thin films in MOS configuration

Victor, P and Nagaraju, J and Krupanidhi, SB (2002) Impact of microstructure on the electrical properties of zirconium titanate thin films in MOS configuration. In: 13th IEEE International Symposium on Applications of Ferroelectrics, 2002. ISAF 2002, 28 May-1 June, Nara,Japan, 207 -210.

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Abstract

Zirconium titanate thin films were deposited on p -type Si substrate by pulsed excimer laser ablation technique. The thin films were highly oriented along (020) and polycrystalline depending on the deposition parameters. A correlation of the microstructure with the electrical properties has been studied in detail. C-V, G-V and DC leakage current studies were done on both types of the films. The higher dielectric constant and higher leakage current were observed on the highly oriented thin films than the polycrystalline thin films. The C-V and G-V measurements were carried at higher frequency ranging from 1 kHz to 100 kHz in elevated temperatures and the activation energy calculated from arrhenius plot were approximately half the silicon band gap. This suggests that generation recombination mechanism is taking place in the depletion region of Si substrate through bulk traps. The interface states were calculated using high frequency method and it were higher for the polycrystalline than highly oriented thin films. The electronic conduction mechanism is analysed on both the types of films in detail, applying different kinds of mechanism like Poole-Frenkel, Schottky and space charge limited conduction.

Item Type: Conference Paper
Additional Information: Copyright 1990 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 20 Jan 2006
Last Modified: 19 Sep 2010 04:23
URI: http://eprints.iisc.ernet.in/id/eprint/5157

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