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The effect of strain on nonlinear temperature dependence of resistivity in $SrMoO_3$ and $SrMoO_{3-x}N_x$ films

Lekshmi, Chaitanya I and Gayen, Arup and Hegde, MS (2005) The effect of strain on nonlinear temperature dependence of resistivity in $SrMoO_3$ and $SrMoO_{3-x}N_x$ films. In: Materials Research Bulletin, 40 (1). pp. 93-104.

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Abstract

Highly oriented $SrMoO_3$ thin films have been fabricated by pulsed laser deposition of $SrMoO_4$ in hydrogen. The films are found to grow along the (1 0 0) direction on $LaAlO_3$ (1 0 0) and $SrTiO_3$ (1 0 0) substrates. The method has been extended for the fabrication of oxynitride thin films, using ammonia as the reducing medium. The resistivity measurements show nonlinear temperature dependent $(T^n)$ behaviour in the temperature interval of 10–300 K. The conduction mechanism is largely affected by the strain due to the substrate lattice. A combination of $T$ and $T^2$ dependence of resistivity on temperature is observed for films having lesser lattice mismatch with the substrate. The X-ray photoelectron spectroscopic studies confirm the formation of $SrMoO_3$ and $SrMoO_{3-x}N_x$ films.

Item Type: Journal Article
Additional Information: The Copyright belongs to Elsevier.
Keywords: A. Thin films;A. Oxides;B. Laser deposition;C. Photoelectron spectroscopy;D. Electrical properties
Department/Centre: Division of Chemical Sciences > Solid State & Structural Chemistry Unit
Date Deposited: 28 Mar 2006
Last Modified: 19 Sep 2010 04:24
URI: http://eprints.iisc.ernet.in/id/eprint/5848

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