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Influence of thermal annealing on the composition and structural parameters of DC magnetron sputtered titanium dioxide thin films

Karunagaran, B and Kumar, Rajendra RT and Mangalaraj, D and Narayandass, Sa K and Rao, Mohan G (2002) Influence of thermal annealing on the composition and structural parameters of DC magnetron sputtered titanium dioxide thin films. In: Crystal Research and Technology, 37 (12). pp. 1285-1292.

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Abstract

Titanium dioxide films have been deposited using DC magnetron sputtering technique. Films were deposited onto RCA cleaned p-silicon substrates at the ambient temperature at an oxygen partial pressure of $7 \times 10^{-5}$ mbar and sputtering pressure of $1 \times 10 ^{-3}$ mbar. The deposited films were annealed in the temperature range 673-873 K. The structure and composition of the films were confirmed using X-ray diffraction and Auger electron spectroscopy. The structure of the films deposited at the ambient was found to be amorphous and the films annealed at 673 K and above were crystalline with anatase structure. The lattice constants, grain size, microstrain and the dislocation density of the film are calculated and correlated with annealing temperature.

Item Type: Journal Article
Additional Information: The copyright belongs to WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Keywords: Titanium dioxide thin films;DC magnetron sputtering;AES;Structural parameters
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 01 Feb 2007
Last Modified: 27 Aug 2008 11:53
URI: http://eprints.iisc.ernet.in/id/eprint/6297

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