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Electrical properties of diamond-like carbon films grown using ECR plasma decomposition of methane

Patra, SK and Rao, Mohan G (2004) Electrical properties of diamond-like carbon films grown using ECR plasma decomposition of methane. In: Vacuum, 74 (1). pp. 93-97.

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Abstract

Diamond-like carbon films were deposited on p-type silicon substrates by ECR-plasma decomposition of methane. The films have been characterized by scanning electron microscopy and Fourier transformed infrared spectroscopy. The current–voltage (I–V) and capacitance–voltage (C–V) characteristics were measured allowing interface trapped charges to be estimated. The density of states near to the Fermi level was calculated from the measurements to be of the order of $10^{19}cm\hspace{2mm}^{3}eV^{1}.$

Item Type: Journal Article
Additional Information: The copyright belongs to Elsevier.
Keywords: DLC coatings;ECR plasma;Methane;FTIR spectra;Density of states
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 11 May 2006
Last Modified: 19 Sep 2010 04:26
URI: http://eprints.iisc.ernet.in/id/eprint/6674

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