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Microstructure evolution and metastable phase formation in laser-ablation-deposited films of $Ti_5Si_3$ intermetallic compound

Bysakh, Sandip and Das, Puspendu Kumar and Chattopadhyay, Kamanio (2002) Microstructure evolution and metastable phase formation in laser-ablation-deposited films of $Ti_5Si_3$ intermetallic compound. In: Philosophical Magazine A, 82 (6). pp. 1235-1248.

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Abstract

Thin films of $Ti_{62.5}Si_{37.5}$ composition were deposited by the pulsed-laser ablation technique on single-crystal NaCl substrates at room temperature and on 'single-crystal' superalloy substrates at elevated temperatures. Both vapour and liquid droplets generated by pulsed-laser ablation of the target become quenched on the substrate. Amorphization had taken place in the process of quenching of vapour-plasma as well as small liquid droplets on NaCl substrates at room temperature. In addition to the formation of $Ti_5Si_3$, a metastable fcc phase $(a_0 = 0.433 nm)$ also forms in micron-sized large droplets as well as in the medium-sized submicron droplets. The same metastable fcc phase nucleates during deposition from the vapour state at 500°C and at 600°C on a superalloy substrate as well as during crystallization of the amorphous phase. The evolution of the metastable fcc phase in the Ti-Si system during non-equilibrium processing is reported for the first time.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Taylor and Francis.
Department/Centre: Division of Mechanical Sciences > Materials Engineering (formerly Metallurgy)
Date Deposited: 11 Jan 2007
Last Modified: 27 Aug 2008 12:09
URI: http://eprints.iisc.ernet.in/id/eprint/7452

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