Balasubramanian, Sathya and Kumar, Vikram and Balasubramanian, N (1994) Reduced phosphorus loss from InP surface during hydrogen plasma treatment. In: Applied Physics Letters, 64 (13). pp. 1696-1698.
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A new method for plasma hydrogenation of InP with a reduced phosphorus loss is reported. The loss of P from InP surface is suppressed by the use of a sacrificial InP wafer kept directly in the plasma while the test sample is kept away from it in a downstream geometry. It is shown using photoluminescence that the P vacancy related transitions are considerably reduced for InP hydrogenated in the presence of a sacrificial wafer when compared to the one hydrogenated without it. The results suggest the utility of the sacrificial InP wafer in providing a P overpressure during H plasma exposure.
|Item Type:||Journal Article|
|Additional Information:||Copyright of this article belongs to American Institute of Physics.|
|Department/Centre:||Division of Physical & Mathematical Sciences > Physics|
|Date Deposited:||30 Jun 2006|
|Last Modified:||19 Sep 2010 04:29|
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